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Huawei tipped to make 3nm chips in 2026
Huawei tipped to make 3nm chips in 2026

GSM Arena

time3 days ago

  • Business
  • GSM Arena

Huawei tipped to make 3nm chips in 2026

Huawei is developing a true 5 nm production line without the need for EUV lithography machines. Furthermore, 3 nm chips are already in the R&D stage, with plans to start production by 2026, according to a report by UDN. Huawei cannot use standard EUV technology, as it is patented by the Dutch company ASML, which is banned from working with the Chinese manufacturer. Instead, the company is using SSA800 lithography machines with multi-patterning, made by Shanghai Micro Electronics (SMEE). Research and development for 3nm chips are following two approaches: one is GAA architecture (the standard one, used by TSMC and Samsung), and the other is a carbon nanotube-based chip that has already completed lab validation and is now being adapted for SMIC's production lines. Earlier this month, the Huawei Matebook Fold arrived, powered by Kirin X90. While the company calls it a "5nm chip," it is actually a 7nm design with advanced packaging technology. It brings performance on par with other 5 nm chips, but the yield is only 50%, which is extremely low, making the chip more expensive to manufacture. Source

EUV lithography restrictions on China must continue, Trump aide says
EUV lithography restrictions on China must continue, Trump aide says

Reuters

time23-05-2025

  • Business
  • Reuters

EUV lithography restrictions on China must continue, Trump aide says

May 23 (Reuters) - Restricting the sale of extreme ultraviolet (EUV) lithography equipment to China is the "single most important export control" the United States has in the area of semiconductors, the White House's AI and crypto czar David Sacks said on Friday. "The first Trump administration began the restriction, and it's of paramount importance that it continues," Sacks wrote on X. Dutch company ASML ( opens new tab makes EUV chipmaking machines, which produce the most sophisticated semiconductors. Lithography systems use beams of light to help to create the chip circuitry. ASML's first generation of EUV systems, currently used to make most chips in smartphones and AI chips, use light in the "extreme ultraviolet" wavelength to create design features down to 13 nanometres in resolution, smaller than a virus.

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