Latest news with #SteveCarson
Irish Times
09-05-2025
- Entertainment
- Irish Times
Eurovision: RTÉ gets ‘commitment' from European Broadcasting Union to discuss Israel participation
RTÉ has said it has received a commitment from the European Broadcasting Union (EBU) to have a 'wider discussion amongst members' concerning Israel's participation in the Eurovision Song Contest . It comes after the national broadcaster's director general, Kevin Bakhurst, sought a discussion on Israel's inclusion with the EBU, which organises Eurovision. He had said he was 'appalled' by the ongoing events in the Middle East and the 'horrific impact on civilians in Gaza '. In a statement, RTÉ said Mr Bakhurst and the broadcaster's director of video, Steve Carson, met the EBU on Friday, during which they 'raised RTÉ's concerns'. 'There is a commitment from the EBU to have a wider discussion amongst members in due course,' said an RTÉ spokesman following the meeting. READ MORE The EBU said: 'We can confirm we had a conversation with RTÉ and have listened to their concerns. The EBU will continue to listen to all members. 'As we did in 2024, we will have a broader discussion when the contest concludes with all participating broadcasters to reflect on all aspects of this year's event.' Earlier this week, Mr Bakhurst said: 'Notwithstanding the fact that the criterion for participating in the Eurovision Song Contest is membership of the European Broadcasting Union, RTÉ has nonetheless asked the EBU for a discussion on Israel's inclusion in the contest.' Mr Bakhurst's intervention came after Eurovision chiefs pushed back against Irish objections to Israel's participation, claiming earlier on Wednesday that no national broadcaster has 'publicly opposed' the country taking part. Journalists in the NUJ branch of RTÉ had also called on the national broadcaster to file an objection against Israeli participation with the EBU. [ Charlie McGettigan joins artists calling for Israel to be expelled from Eurovision Song Contest Opens in new window ] [ 'So much gratitude in West Bank for Irish solidarity': How Nobel Prize-winners are raising Palestinians' plight Opens in new window ] The contest's director, Martin Green, said the EBU was aligned with other international groups that have 'maintained their inclusive stance towards Israeli participants' in big competitions. Asked about RTÉ's goal in its intervention and whether Ireland could pull out of Eurovision, Mr Bakhurst said on Wednesday: 'We absolutely won't pull out of it. 'I just wanted to voice our concerns. I want to have a discussion with them.' He added that it is a 'very complicated issue' and he was 'well aware' that a number of EBU members would not be in favour of excluding Israel. The Eurovision Song Contest takes place next week in Basel, Switzerland, with the semi-finals on Tuesday and Thursday (May 13th and May 15th), and the final on Saturday (May 17th).
RTÉ News
30-04-2025
- Entertainment
- RTÉ News
RTÉ announces 'unprecedented' year ahead for Irish drama
RTÉ has announced an "unprecedented" line-up of original Irish drama in production, which will deliver 142 hours of high-quality, homegrown storytelling across screens in Ireland and around the world". Sharing the drama slate, RTÉ said: "Working with a number of national and international co-production partners, this significant level of original RTÉ drama production represents a sizable investment in Irish talent, culture, and the broader creative economy. "Nine major RTÉ dramas will be shot in 2025, all featuring emerging and established Irish acting talent with filming taking place across Ireland's city streets and coastal towns, showcasing the range and reach of Irish storytelling and featuring the beauty of our native landscapes. Productions are also under way in international locations in Spain, Belgium, and Tenerife." Fair City and new seasons of hit series such as Hidden Assets (season 3), The Dry (season 3), Obituary (season 2), and SisterS (season 2) are currently in production. Also on the slate are The Walsh Sisters and These Sacred Vows, along with four new standalone dramas commissioned under the Storyland banner. These projects are being developed in collaboration with a range of production companies and funding partners, including Screen Ireland, Coimisiún an Meán, and international broadcasters such as BBC, ITV, Hulu and AMC. Another new drama and comedy will be announced in the coming weeks. "The increase in volume means that RTÉ is able to deliver a real range and variety of productions featuring a compelling mix of returning favourites, new voices, and diverse storytelling, while all reflecting the truth and reality of life in Ireland," RTÉ continued. "Collectively, these dramas will employ over 1,800 people, including scriptwriters, directors, producers, actors, hair and make-up teams, wardrobe, and various other creative talents, underpinning RTÉ's commitment to ongoing investment in the Irish creative economy and the independent production sector. "In addition to bringing powerful Irish stories to local audiences, RTÉ has already secured international sales for these productions in 27 territories and regions worldwide. This ensures reaching out to the Irish living abroad and capturing an international audience, once again reinforcing the promotion of great local drama on an international stage." Director of Video at RTÉ, Steve Carson, said: "Irish drama is making an impact on the world stage, and RTÉ is delighted to play our part in this surge of Irish creative talent. "The range and quality of Irish drama in production this year is driven by our new direction strategy, working with partners across the creative sector to develop and showcase the Irish stories for audiences at home and abroad."
Yahoo
26-02-2025
- Automotive
- Yahoo
Intel has processed 30,000 wafers with High-NA EUV chipmaking tool
When you buy through links on our articles, Future and its syndication partners may earn a commission. Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these systems for research and development purposes, and so far, Intel has processed tens of thousands of wafers using them. Intel installed and started using two High-NA EUV lithography tools from ASML at its D1 development fab near Hillsboro, Oregon, last year and has now processed as many as 30,000 wafers using these systems, Intel engineer Steve Carson revealed at the SPIE Advanced Lithography + Patterning conference. Intel was the first leading chipmaker to get High-NA EUV machines (which are believed to cost €350 million each) last year and plans to use them to produce its 14A (1.4nm-class) chips several years down the road. Adopting an all-new manufacturing tool ahead of competitors is important, as it enables Intel to develop various High-NA EUV manufacturing aspects (such as glass for photomasks, pellicles for photomasks, chemicals, etc.) that could eventually become industry standards. Also, ASML is poised to develop its Twinscan EXE:5000 High-NA EUV tools with feedback provided by engineers from Intel, which could give the American giant an edge over competitors over time. Processing 30,000 wafers in a quarter is far below what commercial-grade systems can do. However, the number is massive for R&D usage, demonstrating how serious Intel is about becoming the leading chip maker in the High-NA EUV era. Although ASML considers its Twinscan EXE:5000 High-NA EUV lithography tools to be pre-production tools not designed for high-volume manufacturing, Intel has reportedly said these systems are 'more reliable than earlier models.' Still, the report does not elaborate on whether ASML's Twinscan EXE:5000 is more reliable than the company's pre-production Twinscan NXE:3300 tool from 2013, which was used to develop the existing EUV ecosystem, or the production-grade Twinscan NXE:3600D or NXE:3800E that are used for high-volume manufacturing (HVM) today. Considering that ASML uses similar light sources for NXE and EXE machines, they may indeed be very reliable. ASML's Twinscan EXE High-NA EUV lithography tools can achieve a resolution of down to 8nm with a single exposure, a substantial improvement compared to Low-NA EUV systems that offer 13.5nm resolution with a single exposure. While current-generation Low-NA EUV tools can still achieve an 8nm resolution with double patterning, this lengthens the product cycle and can affect yields. High-NA EUV tools reduce the exposure field by half compared to Low-NA EUV systems, which require chip developers to alter their designs. Given the costs and peculiarities of High-NA EUV litho systems, all chipmakers have different strategies for their adoption. Intel clearly wants to be the first adopter, whereas TSMC is a little more cautious.
